Cleaning Station
Cleansing of particles and residues on chiplet and wafer surface
Angebotsfrist:03. März 2026(abgelaufen)
Typ:Ausschreibung
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Inhalt auf einen Blick
Cleansing of particles and residues on chiplet and wafer surface
- Ausschreibungstyp: Ausschreibung
- Auftraggeber: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Veröffentlicht: 27. Januar 2026
- Frist: 03. März 2026
Ausschreibungsbeschreibung
Cleansing of particles and residues on chiplet and wafer surface
Weiterführende Details
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Dokumente und Anhänge
49 Dateien erfasst- PDF Notice (BUL)
- PDF Notice (SPA)
- PDF Notice (CES)
- PDF Notice (DAN)
- PDF Notice (DEU)
- PDF Notice (EST)
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